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엑스선광전자분광기(X-ray photoelectron spectroscopy)
- 분석연구원
- 배승묵
- 연락처
- 063-469-1905 / 010-6358-1492
- 설치장소
- 3102호실
- 상태
- 신청가능
- 모델명
- Axis Supra+
- 제조사
- Kratos Analytical Ltd.
분석료
기본료 : 80,000원
1. XPS
- Normal: 120,000원/ea, 70,000원/초과시간(1hr)
- Depth profile : 150,000원/ea, 70,000원/초과시간(1hr)
- Depth profile(Ar cluster사용) 150,000원/ea,
70,000원/초과시간(1hr)
- Imaging : 200,000원/1hr
2. UPS
- Normal 150,000원/ea
- Depth profile : 150,000원/ea, 70,000원/초과시간(1hr)
3. ISS : 150,000원/ea
4. Temperature dependence : 100,000원/ea
5. 기타 분석(Auger/SEM)은 협의 후 결정
6. 내부 분석료
Normal: 100,000원/ea, 50,000원/초과시간(1hr)
- Depth profile : 100,000원/ea, 50,000원/초과시간(1hr)
- Depth profile(Ar cluster사용) 100,000원/ea,
50,000원/초과시간(1hr)
- Imaging : 140,000원/1hr
2. UPS
- Normal 100,000원/ea
- Depth profile : 100,000원/ea, 50,000원/초과시간(1hr)
3. ISS : 100,000원/ea
4. Temperature dependence : 100,000원/ea
5. 기타 분석(Auger/SEM)은 협의 후 결정
1. XPS
- Normal: 120,000원/ea, 70,000원/초과시간(1hr)
- Depth profile : 150,000원/ea, 70,000원/초과시간(1hr)
- Depth profile(Ar cluster사용) 150,000원/ea,
70,000원/초과시간(1hr)
- Imaging : 200,000원/1hr
2. UPS
- Normal 150,000원/ea
- Depth profile : 150,000원/ea, 70,000원/초과시간(1hr)
3. ISS : 150,000원/ea
4. Temperature dependence : 100,000원/ea
5. 기타 분석(Auger/SEM)은 협의 후 결정
6. 내부 분석료
Normal: 100,000원/ea, 50,000원/초과시간(1hr)
- Depth profile : 100,000원/ea, 50,000원/초과시간(1hr)
- Depth profile(Ar cluster사용) 100,000원/ea,
50,000원/초과시간(1hr)
- Imaging : 140,000원/1hr
2. UPS
- Normal 100,000원/ea
- Depth profile : 100,000원/ea, 50,000원/초과시간(1hr)
3. ISS : 100,000원/ea
4. Temperature dependence : 100,000원/ea
5. 기타 분석(Auger/SEM)은 협의 후 결정
장치용도
1. 전자재료, 금속재료, 고분자등의 표면 조성 및 산화상태등 분석
2. 화합물의 조성 및 결합상태에 따른 결합에너지 특성분석
3. 표면의 선택적 분석 및 depth profiling
4. work function 측정(UPS)
5. band gap 측정(REELS)
6. 나노 스케일의 극표면층 원소정보 확인(ISS)
2. 화합물의 조성 및 결합상태에 따른 결합에너지 특성분석
3. 표면의 선택적 분석 및 depth profiling
4. work function 측정(UPS)
5. band gap 측정(REELS)
6. 나노 스케일의 극표면층 원소정보 확인(ISS)
주요규격
1. Electron energy analyser with automated lens system
(1) 165mm mean radius hemispherical analyser
(2) Analysis area : 700x300um, 110um, 55um, 27um, 15um
(3) Detector : 128 channel delay line detector
(4) Detection mode : Spectroscopy, snapshot, parallel XPS imaging
(5) Sweep mode : FAT and FRR
(6) Energy range : 10 to 3200 eV, 3.125 meV min. step size
(7) Pass energy : 5, 10, 20, 40, 80, 160 eV
(8) XPS energy resolution(Ag 3d5/2 peak) : ≤0.48eV FWHM , 650,000 CPS
(9) XPS energy resolution on insulator(PET C1s peak) : ≤0.68eV, 20,000 CPS
(10) Spatial resolution of XPS imaging : ≤1um on knife edge
(11) Analsys area of XPS imaging : 800x800um, 400x400um, 200x200um,
80x80um field of view
2. Automated monochromatic micro focus X-ray source
(1) Anode material : Al anode
(2) Rowland circle : 500mm
(3) X-ray power : 600W(max 40mA at 15kV)
(4) Interlocks : Vacuum pressure & cooling water flow rate
(5) Cooling : Cooling water circuits for anode and monochromator backplane
(6) Automatic control : Full data system control and adjustment
(7) Additional silver anode for high energy XPS
3. UHV analysis chamber and pumping system
(1) Material : Mu metal UHV chamber
(2) Minimum pressure : <5x10-10 Torr
(3) Pumping system
- Turbo molecular pump : 400 l/s
- Ti sublimation pump
- Rotary backing pump
(4) Optic camera on analysis position : max. x12 zoom
4. Load lock chamber and pumping system
(1) Material : UHV compatible chamber
(2) Minimum pressure : <5x10-9 Torr
(3) Pumping system
- Turbo molecular pump : 240 l/s
- Rotary backing pump
(4) Optic camera for sample holder view
(5) Automated sample holder magazine : Max 3 sample holders loaded
5. Automated five axis manipulator
(1) High precision : 2um stage resolution
(2) Automated control by software
(3) Standard reference meterials(Au, Ag, Cu, Au grid) mounted
(4) Sample tilt : ±90°
(5) Zalar rotation for depth profile : ±180°
(6) Three sample holders are supplied.
6. Dual mode ion cluster source
(1) Dual mode : Monatomic mode and cluster mode
(2) Monatomic mode : 0.5 ~ 8keV
(3) Cluster mode : 0.5 ~ 20keV, 500~3,000 cluster size, min 250um spot size
(4) Double filament
(5) Differential pumping : Two turbo molecular pumps
(6) Fully automated switch between Monatomic and Cluster mode
(7) Gas used : Ar gas
7. Ion scattering spectroscopy(ISS)
(1) Sensitivity : 12,000 cps/nA@12eV FWHM using 1kV He+ ions on pure Au
8. Automated UPS(Ultraviolet Photoelectron Spectroscopy) package
(1) Windowless gas discharge lamp
(2) Automatic differential pumping system via solenoid valves
(3) Automatic piezoelectric gas introduction system
(4) UV source power supply
(5) UPS performance on clean Ag 4d peak
- He I : 1,000,000 CPS @ 120meV resolution
(6) Minimum step size for UPS mode : 1meV
9. Field emission electron source for SEM, SAM, AES
(1) 10kV Schottky field emission electron source
(2) Power supply unit for control of electron source
(3) Integrated 15 l/s ion pump and controller
(4) Secondary electron detector
(5) Anti-vibration kit
(6) SEM spatial resolution : <200nm @ 10kV and 5nA sample current
(7) Auger spectral sensitivity : >500,000 cps
(8) Auger spectral signal to noise : 500 : 1
10. REELS(Reflected electron energy loss spectroscopy)
(1) Using low energy electrons from field emission electron source
11. Sample heating and cooling package
(1) In-situ heating and cooling of samples in load lock and analysis chamber
(2) Temperature : +800℃ ~ -100℃(by liquid nitrogen)
(3) Temperature is regulated by a PID controller
(4) Heat & cool sample holder with on board heater and thermocouple
(5) Cable, piping and liquid nitrogen Dewar
(6) PC software for control of heat & cool devices
12. Multi contact shuttle sample holder package
(1) 4 additional electrical contacts on sample stage for battery application
(2) Wobble stick kit
(3) TC multi contact sample holder : for heat, cool and electrical connections
(4) Plain shuttle holder : for air sensitive sample.
(5) TC multi contact shuttle holder : for heat, cool, electrical connection and
air sensitive samples
(6) Powder shuttle holder : for air sensitive powder samples
13. Glove box
(1) Attaches directly to load lock
(2) The operator should be able to choose between loading the standard sample holders through
the glovebox or directly into the loadlock chamber.
(3) 2 rubber gloves for sample mounting
14. Additional sample preparation chamber
(1) UHV surface science vacuum chamber
(2) Designed for surface science accessories, such as deposition, LEED, SIMS,
crystal cleavers, gas dosing and etcs.
(3) Linear transfer mechanism
(4) Automated gate valve
(5) Sample parking system for 3 sample stubs(15mm diameter)
(6) Manual XYZƟ sample stage
15. Pumping and gauging kit for sample preparation chamber
(1) Pumping : Turbo molecular pump 400 l/s
(2) Vacuum gauging : Ion gauge
16. Data system
(1) MS Windows 10 Professional 64 bit operating system
(2) HP Z2 Tower G4 Workstation or similar
(3) Intel® Core® i7 3.6GHz processor(or equivalent)
(4) 8 GB RAM
(5) DVD writer
(6) 1 TB hard disk
(7) 2 x 24“ IPS LED backlit monitors
17. Water chiller and re-circulator
(1) Cooled re-circulating water supply
(2) Deionising kit
(3) Safety interlocks to prevent instrument damage
(4) Pressure boost pump
(1) 165mm mean radius hemispherical analyser
(2) Analysis area : 700x300um, 110um, 55um, 27um, 15um
(3) Detector : 128 channel delay line detector
(4) Detection mode : Spectroscopy, snapshot, parallel XPS imaging
(5) Sweep mode : FAT and FRR
(6) Energy range : 10 to 3200 eV, 3.125 meV min. step size
(7) Pass energy : 5, 10, 20, 40, 80, 160 eV
(8) XPS energy resolution(Ag 3d5/2 peak) : ≤0.48eV FWHM , 650,000 CPS
(9) XPS energy resolution on insulator(PET C1s peak) : ≤0.68eV, 20,000 CPS
(10) Spatial resolution of XPS imaging : ≤1um on knife edge
(11) Analsys area of XPS imaging : 800x800um, 400x400um, 200x200um,
80x80um field of view
2. Automated monochromatic micro focus X-ray source
(1) Anode material : Al anode
(2) Rowland circle : 500mm
(3) X-ray power : 600W(max 40mA at 15kV)
(4) Interlocks : Vacuum pressure & cooling water flow rate
(5) Cooling : Cooling water circuits for anode and monochromator backplane
(6) Automatic control : Full data system control and adjustment
(7) Additional silver anode for high energy XPS
3. UHV analysis chamber and pumping system
(1) Material : Mu metal UHV chamber
(2) Minimum pressure : <5x10-10 Torr
(3) Pumping system
- Turbo molecular pump : 400 l/s
- Ti sublimation pump
- Rotary backing pump
(4) Optic camera on analysis position : max. x12 zoom
4. Load lock chamber and pumping system
(1) Material : UHV compatible chamber
(2) Minimum pressure : <5x10-9 Torr
(3) Pumping system
- Turbo molecular pump : 240 l/s
- Rotary backing pump
(4) Optic camera for sample holder view
(5) Automated sample holder magazine : Max 3 sample holders loaded
5. Automated five axis manipulator
(1) High precision : 2um stage resolution
(2) Automated control by software
(3) Standard reference meterials(Au, Ag, Cu, Au grid) mounted
(4) Sample tilt : ±90°
(5) Zalar rotation for depth profile : ±180°
(6) Three sample holders are supplied.
6. Dual mode ion cluster source
(1) Dual mode : Monatomic mode and cluster mode
(2) Monatomic mode : 0.5 ~ 8keV
(3) Cluster mode : 0.5 ~ 20keV, 500~3,000 cluster size, min 250um spot size
(4) Double filament
(5) Differential pumping : Two turbo molecular pumps
(6) Fully automated switch between Monatomic and Cluster mode
(7) Gas used : Ar gas
7. Ion scattering spectroscopy(ISS)
(1) Sensitivity : 12,000 cps/nA@12eV FWHM using 1kV He+ ions on pure Au
8. Automated UPS(Ultraviolet Photoelectron Spectroscopy) package
(1) Windowless gas discharge lamp
(2) Automatic differential pumping system via solenoid valves
(3) Automatic piezoelectric gas introduction system
(4) UV source power supply
(5) UPS performance on clean Ag 4d peak
- He I : 1,000,000 CPS @ 120meV resolution
(6) Minimum step size for UPS mode : 1meV
9. Field emission electron source for SEM, SAM, AES
(1) 10kV Schottky field emission electron source
(2) Power supply unit for control of electron source
(3) Integrated 15 l/s ion pump and controller
(4) Secondary electron detector
(5) Anti-vibration kit
(6) SEM spatial resolution : <200nm @ 10kV and 5nA sample current
(7) Auger spectral sensitivity : >500,000 cps
(8) Auger spectral signal to noise : 500 : 1
10. REELS(Reflected electron energy loss spectroscopy)
(1) Using low energy electrons from field emission electron source
11. Sample heating and cooling package
(1) In-situ heating and cooling of samples in load lock and analysis chamber
(2) Temperature : +800℃ ~ -100℃(by liquid nitrogen)
(3) Temperature is regulated by a PID controller
(4) Heat & cool sample holder with on board heater and thermocouple
(5) Cable, piping and liquid nitrogen Dewar
(6) PC software for control of heat & cool devices
12. Multi contact shuttle sample holder package
(1) 4 additional electrical contacts on sample stage for battery application
(2) Wobble stick kit
(3) TC multi contact sample holder : for heat, cool and electrical connections
(4) Plain shuttle holder : for air sensitive sample.
(5) TC multi contact shuttle holder : for heat, cool, electrical connection and
air sensitive samples
(6) Powder shuttle holder : for air sensitive powder samples
13. Glove box
(1) Attaches directly to load lock
(2) The operator should be able to choose between loading the standard sample holders through
the glovebox or directly into the loadlock chamber.
(3) 2 rubber gloves for sample mounting
14. Additional sample preparation chamber
(1) UHV surface science vacuum chamber
(2) Designed for surface science accessories, such as deposition, LEED, SIMS,
crystal cleavers, gas dosing and etcs.
(3) Linear transfer mechanism
(4) Automated gate valve
(5) Sample parking system for 3 sample stubs(15mm diameter)
(6) Manual XYZƟ sample stage
15. Pumping and gauging kit for sample preparation chamber
(1) Pumping : Turbo molecular pump 400 l/s
(2) Vacuum gauging : Ion gauge
16. Data system
(1) MS Windows 10 Professional 64 bit operating system
(2) HP Z2 Tower G4 Workstation or similar
(3) Intel® Core® i7 3.6GHz processor(or equivalent)
(4) 8 GB RAM
(5) DVD writer
(6) 1 TB hard disk
(7) 2 x 24“ IPS LED backlit monitors
17. Water chiller and re-circulator
(1) Cooled re-circulating water supply
(2) Deionising kit
(3) Safety interlocks to prevent instrument damage
(4) Pressure boost pump
세부분석/특기사항
- 고분해능 이미징
- XPS, UPS, AES, ISS, REELS
(X선광전자분광기, 자외선광배출분광, 오제전자분광, 이온산란분광, 반사전자에너지손실 스펙트럼분석)
- 글로브박스, 셔틀 홀더, 가열 및 냉각기능
- 전압 및 전류측정 기능
- 확장 진공챔버
- 최신 활용분야 : 2차전지등 배터리, 반도체, 바이오소재등
- XPS, UPS, AES, ISS, REELS
(X선광전자분광기, 자외선광배출분광, 오제전자분광, 이온산란분광, 반사전자에너지손실 스펙트럼분석)
- 글로브박스, 셔틀 홀더, 가열 및 냉각기능
- 전압 및 전류측정 기능
- 확장 진공챔버
- 최신 활용분야 : 2차전지등 배터리, 반도체, 바이오소재등